About the role#
As a Process Pathfinding Dry Etch Intern, you will work in a research-focused environment dedicated to next-generation memory technologies. You will gain hands-on experience with advanced dry etch patterning techniques, semiconductor processing equipment, and characterization methods. Working alongside experienced engineers, you will contribute to technical projects aimed at improving device performance, reliability, and manufacturability.
What you'll do#
- Assist in conducting fundamental research and process development activities for next-generation memory technologies.
- Collaborate with the Pathfinding team to develop and optimize dry etch processes.
- Develop and complete experiments to understand process limitations and evaluate new technologies.
- Apply analytical and statistical methods to characterize process performance.
- Utilize AI-enabled tools to improve data analysis, engineering workflows, and technical decision-making.
What you'll need#
- Currently pursuing a Master's degree or Ph.D. in Materials Science, Physics, Chemistry, Chemical Engineering, or a related technical field.
- Graduation date must be after August 1, 2027.
- Knowledge of vacuum science, RF/plasma science, chemistry, semiconductor processing, or semiconductor equipment.
- Experience with experimental design, data analysis, statistical methods, or laboratory-based research.
- Strong communication, analytical, problem-solving, and interpersonal skills.
Location & details#
- Location: Boise, Idaho
- Work Modality: On-site
- Employment Type: Full-time
- Term: Rolling
- Compensation: Paid position
How to get in at Micron Technology
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